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Materials for the 21st Century$
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David Segal

Print publication date: 2017

Print ISBN-13: 9780198804079

Published to Oxford Scholarship Online: July 2017

DOI: 10.1093/oso/9780198804079.001.0001

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PRINTED FROM OXFORD SCHOLARSHIP ONLINE (oxford.universitypressscholarship.com). (c) Copyright Oxford University Press, 2022. All Rights Reserved. An individual user may print out a PDF of a single chapter of a monograph in OSO for personal use.date: 25 January 2022

The Preparation of Materials

The Preparation of Materials

(p.71) 8 The Preparation of Materials
Materials for the 21st Century

David Segal

Oxford University Press

Chapter 8 covers aspects of materials preparation. It stresses that the availability of high-purity silicon was essential for the semiconductor industry as were high-purity thin films. Availability of critical materials is mentioned. Specific techniques that are mentioned include the polymerase chain reaction, ion implantation, chemical vapour deposition, plasma spraying and sol-gel processing. Polymer synthesis is also described.

Keywords:   polymerase chain reaction, thin films, critical materials, ion implantation, sol-gel processing, chemical vapour deposition, plasma spraying

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